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Evidence-first technology, science and health reporting.

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DRAM

Recent reporting, analysis and explainers from the DRAM desk.

Representational Khabre illustration for Samsung and ASML expand collaboration on High NA EUV and 12-inch photomask technology

technology

Samsung plans High NA EUV DRAM manufacturing by 2028 in expanded ASML partnership

Samsung and ASML are expanding their semiconductor-manufacturing partnership, including Samsung's planned use of High NA EUV for future DRAM high-volume manufacturing by 2028 and participation in a 12-inch photomask initiative.

2026-09-09T00:30:27+05:30
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